AI Cooling Firm ZutaCore Secures $100M in Series C Funding
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AI Cooling Firm ZutaCore Secures $100 Million in Series C Funding

The round was led by Mitsubishi Electric, Carrier, and Samsung to fuel global expansion.

6/3/2026
Ghita Khalfaoui
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ZutaCore, a pioneer in advanced liquid cooling systems, has successfully closed a $100 million Series C funding round to address the escalating thermal demands of artificial intelligence. The investment was led by a consortium of global technology leaders, including Mitsubishi Electric, Carrier, and Samsung Electronics. This significant capital infusion will accelerate the company's global expansion and scale the deployment of its waterless, direct-to-chip cooling technology.


The Overheating AI Revolution

The rapid proliferation of AI applications is fundamentally reshaping data center architecture, introducing significant cooling challenges for operators. Traditional air-cooling systems are proving increasingly inadequate to handle the heat generated by next-generation AI processors. This thermal bottleneck threatens to limit the performance and scalability of critical high-performance computing infrastructure.

Power consumption within server racks has skyrocketed, climbing from approximately 10 kilowatts to more than 100 kilowatts in advanced AI deployments. The vast majority of this energy is converted into heat that must be removed efficiently to ensure stable operation. This surge in power density has created an urgent need for more effective and sustainable thermal management solutions.

A Waterless Cooling Innovation

ZutaCore addresses this challenge with its flagship HyperCool technology, a waterless, two-phase, direct-to-chip cooling system. The platform circulates a proprietary non-conductive and non-flammable dielectric liquid directly across the surface of processors. This approach contrasts sharply with water-based systems, eliminating risks associated with leaks and electrical shorts in high-density environments.

The system's efficiency stems from a phase-change process where the liquid absorbs heat, boils, and transforms into vapor. This method of heat transfer is exceptionally effective and allows for the cooling of processors exceeding 4,000 watts. ZutaCore's technology can be integrated into existing data center infrastructure, supporting large-scale deployments and improving overall energy efficiency.

Fueling Global Growth and Development

The $100 million investment brings ZutaCore's total funding to date to approximately $200 million, signaling strong market confidence in its vision. The capital will be strategically deployed to expand the company's global commercial footprint and bolster its sales and partnership networks. It will also fund continued research and development to meet the evolving thermal requirements of future chip architectures.

To support its accelerating momentum, ZutaCore is expanding its leadership team and international presence. The company recently appointed a new Chief Financial Officer, Chief People Officer, Chief Research and Development Officer, and Chief Operating Officer. These additions strengthen the executive team as it prepares to manage worldwide deployments and strategic industry collaborations.

Commitment to Innovation and Community

The company's core research, development, and manufacturing operations are based in its facility near Sderot, Israel. This center houses a sophisticated 2-megawatt thermal simulation and testing platform, enabling the validation of its systems under real-world conditions. This commitment to innovation is demonstrated by recent solutions like its OmniTherm™ cold plate for NVIDIA's latest server GPUs.


With this substantial funding and a clear technological advantage, ZutaCore is poised to become a dominant force in the data center cooling market. Its sustainable, waterless solution directly addresses the critical power and heat challenges posed by the AI era. The company's continued growth and innovation are set to play a vital role in enabling the next generation of high-performance computing.